Applied Physics, Inc. (ÅP™), TEL: 1-720-635-3931, provides PSL and particle contamination wafer standards, Clean Room Foggers, LN2 Foggers, M2001 foggers, along with aerosol instruments, such as the MOUDI Impactor, Cascade Impactor and the Nano-MOUDI to Science Universities and aerosol research laboratories. The CRF-2 Clean Room Fogger and M2001 UltraPure LN2 Fogger are sometimes referred to as Smoke Generators for smoke studies in clean rooms. A smoke generator will visualize airflow patterns and turbulence in Semiconductor and Pharmaceutical facilities. The CRF-2 CleanRoom Fogger has the lower cost, while the M2001 Fogger has the highest fog volume in the industry. Particle Wafer Standards and PSL Wafer Standards are produced on 300mm wafers, 200mm wafers, 150mm wafers, blank photo masks and customer FILM wafers. SiO2 particles are used to produce Particle Wafer Standards; while Silica is used in CMP slurries, Portland cement, solar cell manufacturing, high pressure liquid chromatography, nano-composites, pharmaceutical drug delivery and mesoporous silica nanoparticles (MSN).
PSL Wafer Standards: PSL Wafer Standards, NIST traceable, PSL calibration wafer standards on 300mm, 200mm, 150mm, 125mm, 100mm silicon wafers and FILM WAFERS
Contamination Wafer Standards: SiO2 Particle Wafer Standards, Contamination Wafer Standards using Silica, SiO2, Silicon Dioxide, Aluminum Oxide, Titanium Oxide, Silicon Nitride, Titanium, Tungsten, Copper or Tantalum particles on 300mm, 200mm, 150mm, 125mm, 100mm wafers and FILM WAFERS
PSL Spheres from 20nm to 160 microns, monodisperse PSL spheres
Silica available in bulk, dry powder from 200nm to 2 microns with volumes of 1 Kilo to 200 Kilos for CMP slurries, mesoporous silica nano-particles (MSN), Thin Film, Solar Cell Manufacturing and Nano-Composites.
SiO2 Particles in 15ml bottles of Di Water Solution and 10% concentration from 20nm to 2 microns, monodisperse SiO2 particles
M2001 Fogger: UltraPure Fogger using DI Water and LN2 producing 15CFM of fog for 40 minutes to visualize airflow, patterns and turbulence
Clean Room Fogger, CRF-2: Smoke Generator and airflow visualizer producing second highest volume of fog of all foggers in use today, 9CFM of Fog for 60 minutes or 540 cfm over 60 minutes, DI Water or WFI Water, smoke studies, monitor clean room airflow and turbulence
Room Sanitizer: Compound Pharmacy, ISO 5-9 Suites and Medical Room Decontamination
Our 2300XP1 Particle Deposition System deposits PSL Spheres, silica and SiO2 particles from 32 nm to 5 microns or more on Prime Silicon wafers, blank photo masks, glass substrates or your FILM WAFERS for size calibration of KLA-Tencor Surfscan SP2, KLA-Tencor Surfscan SP1, Surfscan SP3, Surfscan SP5, Surfscan 6420, Surfscan 6220, Surfscan 6200, ADE, Hitachi and Topcon SSIS tools and wafer inspection systems. PSL Spheres and SiO2 particles can be deposited on a 450mm wafer, 300mm wafer, 200mm wafer, 150mm wafer, 125mm wafer or 100mm wafer. PSL Spheres can also be used for size calibration of your laser particle counter. We provide the Clean Room Fogger, which produces the second highest volume of fog of 9cfm for 60 minutes at one of the best prices available. The LN2 fogger produces the highest volume of fog at 15cfm for about 40 minutes. We know our products very well and provide superb customer support.