Applied Physics, Inc. 720-635-3931
PO Box 186 Monte Vista CO 81144
400 N Country Road 2E Monte Vista CO 81144
cleanroom fogger, CRF4 fogger, LN2 fogger, smoke studies, ultrapure fogger, polystyrene latex, size standards, calibration wafer standard, silica particles

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Applied Physics, Inc.

Clean Room Fogger, CRF4

Ultrapure LN2 Fogger, AP35

Calibration Wafer Standard

PSL Wafer Standard

Contamination Wafer Standard

Particle Wafer Standard

Cleanroom Fogger, CRF2

LN2 Nitrogen Fogger

PSL Spheres, Polystyrene Latex Beads

Silica Nanoparticles in DIH2O, 15ml or 100ml volume

Smoke Study to Visualize Airflow and Turbulence

Call Applied Physics, Inc.

1-720-635-3931 or 303-999-6837

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Applied Physics, Inc.

Since 2001 cleanroom foggers have been provided by Applied Physics, Inc. Review cleanroom fogger performance for smoke studies. In 2001 portable foggers using LN2 and deionized (DI) water were developed. Since then our portable foggers have added adjustable airflow control, adjustable fog volume and wireless remote control; as well as rolling trolley, replacing LN2 carry handles. The AP35 and AP100 LN2 ultrapure foggers are the best tools for fog volume control with user friendly operation. Our AP35 and AP100 LN2 foggers use LN2 combined with DI water, sterile water or WFI water vapor. We also provide a lower cost, lower fog volume CRF2 and CRF4 DI water, portable fogger; using ultrasonic cavitation to visualize airflow, turbulence and balance airflow between rooms and door openings. The CRF4 Cleanroom Fogger is by far our best selling fogger due to its small size and excellent fog volume with adjustable controls.
CRF2 Cleanroom Fogger is a low cost fogger producing 0.26 cubic meters fog per minute for 50 minutes at 57 ml fog density per minute providing 7 to 8 feet visible fog for smoke studies using deionized, sterilized or WFI water to to visualize airflow patterns and turbulence in flow hoods, glove boxes and fume hoods. No contamination emitted, fog evaporates back to air we breathe, no clean room wipe down required.CRF2 Cleanroom Fogger video
CRF4 Cleanroom Fogger provides adjustable air flow and fog volume control from 0.25 to 1.25 cubic meters fog per minute for 45 minutes at 187 ml fog density per minute providing 10 to 15 feet visible fog using deionized, sterilized or WFI water for smoke studies in small clean rooms, ISO suites, sterile rooms, RAB, etc. Touch pad control or an optional wireless remote control is provided for operation behind a closed wall. No contamination emitted, as fog evaporates back to air we breathe, no clean room wipe down required.CRF4 Cleanroom Fogger video
AP35 LN2 Fogger provides adjustable airflow and high volume, adjustable fog output, with 5.0 cubic meters fog per minute for 70 minutes at 571 ml fog density per minute providing 20 to 30 feet visible fog using LN2 with deionized, sterilized or WFI water for smoke studies in clean rooms, ISO suites, sterile rooms and medical rooms. Use touch pad control or optional wireless remote control for fogging behind a closed wall. No contamination emitted, fog evaporates back to air we breathe, no clean room wipe down required.AP35 Ultrapure Fogger video
AP100 Ultrapure Fogger is the highest fog volume, adjustable flow fogger, producing 15.5 cubic meters ultrapure fog per minute for about 90 minutes at 1520 ml fog density per minute providing 30 to 40 feet visible fog using deionized, sterilized or WFI water for smoke studies in large clean rooms, or used to produce large volumes of stage and theatric fog fog. Four fog hose outputs are provided for smoke studies in clean rooms, ISO suites, sterile rooms, medical rooms, stages and theaters. Use touch pad control and wireless remote control for operation at a distance. No contamination emitted, fog evaporates back to air we breathe, no clean room wipe down required.
Polystyrene Latex, Particle Size Standards are NIST Traceable, certified particle size standards produced as polystyrene latex beads, available from 20 nanometers to 160 microns. PSL Spheres are highly accurate, particle size standards with a narrow size distribution, suspended in a DI Water solution with a trace surfactant to minimize agglomeration. Polystyrene latex beads are used to create a particle aerosol challenge to calibrate the size accuracy of laser particle counters and produce Calibration Wafer standards.
Silica Particle Size Standards are NIST Traceable, certified particle size standards produced as spherical particles from 30 nm up to 2000 nm, each with 10% concentration; available in 15ml, 100ml, 500ml and 1000ml bottles. CV is typical 3% in size range. No surfactant is used. Silica particles from 30 nm to 102 nm are in solution with ethanol to minimize agglomeration, while silica spheres greater than 102 nm are mixed in deionized water.
Calibration Wafer Standard are certified, NIST traceable, PSL calibration wafer standards deposited with monodisperse, polystyrene latex spheres, at specific sizes selected from 40 nm to 12 microns. Particle counts deposited are typically between 2000 and 20000 counts on the wafer surface. Spot Depositions can be 1 to 4 particle sizes deposited around the wafer with a typical particle count of 2500 per particle size deposited. Calibration Wafer Standards are used to calibrate the size accuracy of scanning surface inspection systems (SSIS) using low powered lasers, such as Tencor 6200, Tencor 6220, Tencor 6400 and 6420, KLA-Tencor SP1, SP2 and Hitachi wafer inspection tools.
Contamination Wafer Standard is deposited with a single, narrow size distribution of silica particles from 40 nm to 2 microns. A Silica Contamination Wafer Standard is typically deposited as a full deposition across the wafer; but can be deposited as a single size or multiple silica sizes deposited as spot depositions, provided with a NIST Traceable, Size Certificate. Each silica particle size has a narrow size distribution of 3% or less. Silica Contamination Wafer Standards are used to calibrate the size accuracy of scanning surface inspection systems (SSIS) using high powered lasers; such as KLA-Tencor SP2, SP3, SP5, SP5xp and Hitachi wafer inspection tools.
CO2 Fogger uses deionized, sterilized or WFI water combined with CO2 Ice to provide a dense fog to video airflow and turbulence about 4 to 6 feet during the first few minutes, but decreases in fog volume over an 8 minute period. A CO2 fogger produces excellent fog for first several minutes to video smoke studies and describe airflow, patterns and turbulence in Pharmaceutical ISO suites guided by USP 797 Pharmaceutical In-Situ Airflow Analysis. As the CO2 ice evaporates, the fog volume decreases to zero.
Passivated, sterilizable, autoclavable Stainless Steel Tools are used in pharmaceutical ISO suites, sterile rooms, medical rooms and semiconductor clean rooms.

PSL Spheres, 20 nm to 900 nm, Polystyrene Latex, Particle Size Standards, 1% concentration, 15 ml volume, NIST Traceable, Size Certified - Buy Now
PSL Spheres, 1 um to 160 um, Polystyrene Latex, Particle Size Standards, < 1% concentration, 15 ml volume, NIST Traceable, Size Certified - Buy Now
Silica, Particle Size Standards, 40 nm to 2000 nm, 10% concentration, 15 ml or 100ml volume, NIST Traceable, Size Certified - Buy Now

VIDEO HIGHLIGHTS
  CRF4 Cleanroom Fogger video CRF2 Cleanroom Fogger video AP35 Ultrapure Fogger video  
CRF4 Cleanroom Fogger Clean Room Fogger Clean Room Ultrapure Fogger
Cleanroom Fogger, CRF4 Fogger, DI water fogger, LN2 Ultrapure Fogger, LN2 Fogger and Portable Fogger are used to visualize airflow, patterns, dead zones and turbulence in smoke studies of clean rooms, sterile rooms, barrier isolators, RABS, gloveboxes and ISO suites. Guidelines for ISO 14644-3 ANNEX B7, USP 797 Insitu Airflow Analysis, Airflow Recovery and Semiconductor clean rooms are supported.

PRODUCT SUMMARIES

 

The AP35 Ultrapure Fogger produces 5 cubic meters fog per minute with 571 ml of fog density per minute to provide 20-30 feet of visual airflow. The CRF2 is the lowest cost fogger available producing 0.26 cubic meters fog per minute with 57 ml fog density to provide 7 to 8 feet of visible airflow in fume hoods and barrier isolators. The CRF4 is a mid range fogger providing 1.25 cubic meters of fog per minute with 187 ml of fog density to visualize airflow for 10 to 15 feet in small clean rooms. The AP100 is a high volume fogger with 15.5 cubic meters per minute at 1520 ml fog density providing 30 to 40 feet of visual airflow in large clean rooms and stages. Cleanroom ultrapure foggers, called LN2 foggers, produce the highest volumes of ultra pure fog with adjustable fog volume, adjustable airflow and wireless remote control. Fogger performance comparison compares typical fog performance of LN2 fogger, CRF4 fogger and DI water foggers. You can determine which fog generator fits the requirements of your smoke studies. Clean room foggers support airflow visualization as defined by USP797, ISO 14644-3, Annex B7; Federal Standards 209E, ISO Standard 14644-1 and 14644-2. Airflow recovery testing at 100:1 recovery time is also supported with the CRF2 or CRF4 Cleanroom Fogger as defined in ISO 14644-3, B12. These tools are often referred to as a smoke generator or smoke machine; used in smoke studies of airflow turbulence in sterile rooms, ISO suites, medical operating rooms, barrier isolators and clean rooms. Applied Physics also provides calibration wafer standards, silica contamination wafer standards, polystyrene latex spheres, SiO2 nano-spheres and silica nano-particles. Contact Applied Physics, Inc. at TEL: 1-303-999-6837.

Cleanroom Fogger using DI Water or WFI Water

CRF4 Cleanroom Fogger Cleanroom foggers are smoke generators used in smoke studies to visualize airflow and turbulence with a pure fog supporting USP 797, ISO 14644 and Federal Standards guidelines in clean rooms, sterile rooms and ISO suites. The CRF4 Cleanroom Fogger provides 187 ml fog density per minute with a fog volume of 1.25 cubic meters per minute for up to 45 minutes operation providing 10 to 15 feet of visible airflow for smoke studies and 3D airflow modeling in clean rooms, ISO suites, medical rooms and sterile rooms. The CRF2 Cleanroom Fogger and CRF4 Cleanroom Fogger provide lower cost operation, CRF2 DI Water Fogger to visualize clean room airflow.

CRF2 and CRF4 Clean Room Fogger Information

Ultrapure LN2 Fogger using Liquid Nitrogen and Water

AP35 Ultrapure Fogger Ultrapure foggers combine LN2 with deionized water, sterile water or WFI water to produce high volumes of ultrapure fog for smoke studies, supporting USP 797 guidelines, ISO 14644-3 and Federal Standards in clean rooms, sterile rooms and ISO suites. The AP35, Ultrapure Fogger provides 571 ml per minute fog density with a fog volume of up to 5 cubic meters per minute for up to 70 minutes with 20 to 30 feet of visible airflow for smoke studies and 3D airflow modeling. 3X more fog volume, 2X more fog density and 2X more aiflow travel distance, costs nearly the same as traditional LN2 foggers. The AP100 Ultrapure Fogger provides 15.5 cubic meters fog per minute at 1520 ml fog density for the largest clean rooms, sterile rooms and ISO suites. Stainless steel enclosures with electro-polish finish.

AP35 Ultrapure Fogger Information

   

Polystyrene Latex Spheres and Beads, Size Standards

PSL Spheres PSL Spheres and polystyrene latex beads are provided with 1% concentration or less in 15ml DI Water for use as particle size standards and aerosol particle challenges. A trace of surfactant is included in each bottle to reduce agglomeration. Surf-Cal, pre-mixed PSL Spheres are provided in 50ml bottles and 1E10 concentration. 1 um to 160 um PSL Spheres are available in 15ml of DI Water Solution are also provided for instrument size calibration. Larger volumes are available as special order.

20 nm to 900 nm PSL Spheres Information

PSL Calibration Wafer Standards

Calibration Wafer Standard Calibration Wafer Standards are produced on Prime Silicon Wafers, your FILM Wafers or bare masks. NIST traceable, Polystyrene Latex (PSL) Spheres are used to produce, Calibration Wafer Standards, are provided from 40 nm to 12 um on 100 mm to 300 mm wafers for calibration of KLA-Tencor Surfscan SP1, SP2, SP3, SP5, SP5xp; Tencor 6200, 6400 and 6420 systems; Topcon, ADE and Hitachi wafer inspection systems. These standards are NIST Traceable with Size Certificate provided with a single size peak deposited as FULL Wafer Deposition across the wafer or deposited with multiple Polystyrene latex sphere size peaks, deposited as spot depositions around the prime silicon wafer, film wafer, glass substrate or photo mask surface.

Calibration Wafer Standard Information

Silica Nanoparticles, Size Standards

Silica Spheres Silica Nano-particles with 10% concentration in 15ml for use as NIST Traceable, silica particle size standards and aerosol particle challenges. Silica is produced as spherical nanoparticles, 3% or less in size distribution from 40 nm to 2000 nm in 10% concentration, available in 15 ml, 100 ml, 500 ml and 1000 ml volumes. Silica particles at 102 nm or below are mixed in an ethanol alcohol solution to minimize agglomeration; while silica particles over 102 nm are mixed in Deionized water. No surfactants are used. SiO2 particle sizes at 60 nm, 102 nm, 269 nm and 895 nm are similar to NIST SRMs at same sizes. Functionalized silica and hydrophobic silica is also available in 1 Kg increments upto 1000 Kg. Bulk, Dry Powder silica is used in commercial silicate, filler in polymers, CMP slurries, nano-composites, high pressure liquid chromatography and mesoporous silica nanoparticles (MSN).

Silica Nanoparticles Information

Silica, Contamination Wafer Standard, Particle Wafer Standard

Contamination Wafer Standard Contamination Wafer Standards are produced on Prime Silicon Wafers, your film wafers or blank masks. NIST traceable, Silica nanoparticles, Contamination Wafer Standards deposited with silica nano-particles are NIST Traceable from 40 nm to 2 um on 150 mm to 300 mm wafers to calibrate KLA-Tencor Surfscan SP2, SP3, SP5, SP5xp; Tencor 6200, 6400 and 6420 systems; Topcon, ADE and Hitachi wafer inspection systems. These contamination wafer stadndard are provided with Size Certificate with a single silical particle size deposited as FULL Wafer Deposition across the wafer or deposited with multiple silica nanoparticle size peaks, deposited as spot depositions around the prime silicon wafer, film wafer, glass substrate or photo mask surface.

Silica Calibration Wafer Standard Information